Publication: Kesan peningkatan suhu terhadap pembentukan titanium silisida
| datacite.subject.fos | oecd::Engineering and technology::Materials engineering | |
| dc.contributor.author | Balakrishnan, Prakash Babu | |
| dc.date.accessioned | 2024-07-16T09:48:39Z | |
| dc.date.available | 2024-07-16T09:48:39Z | |
| dc.date.issued | 2005-03-01 | |
| dc.description.abstract | The purpose of this research is to study the effect of temperature increases subjected to titanium silicide(TiSi2) formation. This study is based on the comparison of thickness sheet resistance and grain size of titanium silicide with temperatures increases. The relation between the sheet resistance with the grain size and the phases present in various temperature also studied in this project. The titanium silicide formed through the depositon of the titanium on the silicon by magnetron sputtering and followed by the two step of anneling (pre and post annealing) within the temperature range 400-1100 oC for 10 minutes. Three types of characteristic carried out in this study are X-ray diffraction (XRD) to determine the presences of titanium silicide phases, scanning electron microscope (SEM) to obtain the the microstructure of the titanium silicide and four point probe todetermine the sheet resistance of titanium silicide which formed in various annealing temperatures. However, the expected results, the formation of TiSi2 didn’t obtained because of the oxygen’s influence in titanium silicide formation. Generally the thickness and grain size of the formed silicide increasse when the annealing temperature increase. But the sheet resistance of the silicide film was decrease when the temperature increases. Various phase of titanium silicide formed in differrent annealing temperature in the range of 400-800 oC, such as TiSi, Ti5Si3 and TiSi2. Besides the the titanium silicide phases, other type of phases also presents, such as oxides of titanium and silicon. | |
| dc.identifier.uri | https://erepo.usm.my/handle/123456789/19734 | |
| dc.language.iso | en | |
| dc.title | Kesan peningkatan suhu terhadap pembentukan titanium silisida | |
| dc.type | Resource Types::text::report | |
| dspace.entity.type | Publication | |
| oairecerif.author.affiliation | Universiti Sains Malaysia |