Publication: Parameter optimization for a thin layer deposition of chromium (cr) by using an electron-beam evaporator and rapid thermal processor system
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Date
2023-07-01
Authors
Nur Balqis Binti Mohamed Dawood
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Abstract
This research paper focuses on studying the parameters of Chromium (Cr) thin films prepared using an electron beam evaporator, followed by a post-annealing process using a rapid thermal processor system. A 100 nm thick Cr thin film was deposited onto a glass substrate and then subjected to post-annealing at various temperatures for a duration of 30 minutes. The thin films were then characterized to investigate their properties. The annealing time used in this study was not suitable for preparing Cr thin films. elemental composition analysis was carried out using Scanning Electron Microscopy (SEM) with Energy-Dispersive X-ray Spectroscopy (EDX). This analysis revealed the presence of other elements on the deposited thin films, indicating the occurrence of potential contamination during the deposition process. Crystallographic analysis was performed using X-ray Diffraction (XRD), which showed that the Cr thin films exhibited a BCC structure. However, the post-annealing process did not induce significant changes in the crystallographic structure or orientation of the thin films