Polycrystalline Silicon Thin Film Solar Cell Fabrication On Polyethylene Terephthalate Substrate By Screen Printing

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dc.contributor.authorMohammed Ali, Mohammed Khalil
dc.date.accessioned2019-12-03T07:21:14Z
dc.date.available2019-12-03T07:21:14Z
dc.date.issued2014-01
dc.description.abstractThin film solar cells with polycrystalline silicon absorber layers are one of the most promising approaches to realizing both high performance and low cost for efficient solar cell technology in the near future. The main goal of this research is to fabricate a flexible polycrystalline silicon thin film solar cell having thicknesses of 1.61 μm to 13.10 μm using the screen printing (SP) technique onto a polyethylene terephthalate (PET) sheet as (A) substrate and (B) superstrate. The PET used has high optical transmittance (93%) in UV-Visible range, a crystallite size of 34.64 nm, with thermal sustainability and a melting point of 254.9 °C. Indium tin oxide (ITO) thin films were deposited on the PET by DC magnetron sputtering and thermal evaporation at thicknesses of 25.0, 87.2 and 114.5 nm and 36.0, 79.2 and 124.5 nm, respectively. The PET substrate coated ITO with thickness of 25.0 nm, optical transmittance of 97% in UV-visible range and surface roughness of 2.32 nm by DC magnetron sputtering, was found suitable for this current work.en_US
dc.identifier.urihttp://hdl.handle.net/123456789/9261
dc.language.isoenen_US
dc.publisherUniversiti Sains Malaysiaen_US
dc.subjectSilicon Thin Film Solaren_US
dc.subjectScreen Printingen_US
dc.titlePolycrystalline Silicon Thin Film Solar Cell Fabrication On Polyethylene Terephthalate Substrate By Screen Printingen_US
dc.typeThesisen_US
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