Chemical Bath Deposition Of Ti-Doped Zno Nanorods For Uv-Photodetector Applications

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Date
2018-04
Authors
Bidier, Shaker Ali Hamad Abu
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Publisher
Universiti Sains Malaysia
Abstract
This work studied the effects of titanium (Ti) on the properties of zinc oxide (ZnO) nanorods (NRs) grown on Si substrates using chemical bath deposition method with TiO2 as a Ti source. X-ray diffraction (XRD) results showed an increase in the crystallite size from 44.4 nm in the undoped sample to 51.2 nm in the doped sample. Photoluminescence results revealed an increment in the energy band gap from 3.241 eV for the undoped sample to 3.293 eV for the doped sample. Hall effect measurements also showed an enhancement in the electrical properties of doped samples, the carrier concentration increased from 8.7×1016 cm-3 for the undoped sample to 2.1×1018 cm-3 for the doped sample. The effects of growth time on the morphology and structure properties of Ti-doped ZnO were studied. With prolong the growth time; energy-filtered transmission electron microscopy images revealed an erosion on the lateral of NRs. This could attribute to the dissolution reaction of ZnO for longer growth time i.e. 6.5h. These results display the role of growth time in the modification of the growth directions. Finally, Ti-doped ZnO NRs based on metal-semiconductor-metal was fabricated. The photoelectric parameters were enhanced for Ti-doped ZnO device as compared to that of the undoped ZnO device. For the undoped device the photocurrent, photosensitivity, and responsivity were 61 μA, 1151 %, and 37.4 mA/W, respectively. However, for the doped device, the parameters were enhanced to 340 μA, 2518 %, and 217.9 mA/W, respectively. This enhancement indicated an improvement in the structural, optical and electrical properties due to the incorporation of Ti into the ZnO lattice structure. The obtained results demonstrate that the Ti-doped ZnO NRs prepared using chemical bath deposition is suitable for optoelectronic applications.
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Effects of titanium on the properties of zinc oxide , grown on Si substrates using chemical bath
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