Designing acrylate-polysiloxane for stretchable and conducting photoresist
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Date
2016-06
Authors
Syukriyah Mohd Yussof
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Abstract
This study examined the stretchable and conductive photoresist due to higher demand of stretchable electronics. Now, SU-8 is a material used as a photoresist, but it is rigidand high manufacturing cost. So, acrylate and polysiloxane incorporated with silver filler is chosen to replace SU-8 as photoresist due to stretchable, conductive and low manufacturing cost. This copolymer was prepared using MPS and PDMS as monomer. Incorporation of silver filler in MPS/PDMS matrix result in the formation of conductive and stretchable photoresistthrough dual-curing system where the photoresist was exposed to UV-cure and condensation reaction. The pure MPS/PDMS and Ag-MPS/PDMS were stirred for homogenous mixing. Then, the material prebake followed by UV-Cure and postbake. The formation of covalent bond wasinduced by free radical polymerization followed by the formation of flexible crosslinking between MPS and PDMS chain during condensation reaction. From the analysis and studies, pure MPS/PDMS for ratio 1:1 have high elastic properties as shown in thermal and mechanical characterization due to higher mobility of polymer chain but poor toughness compared to ratio 2:1 and 3:1. Thus, ratio 1:1 of MPS/PDMS was choosen to incorporate with silver filler. From thermal, mechanical, structure and conductivity properties of Ag-MPS/PDMS, 400% loading of silver show high thermal stability and conductive properties of conductive copolymer photoresist compare to 200% and 300%, but the stretchability reduce due to the present of silver which develop into higher rigidity to the crosslink network. So, ratio MPS/PDMS 1:1 incorporate 400% silver choose as conductive and stretchable photoresist.