Patterning of strechable photoactive acrylate-siloxane copolymer using photolithography technique
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Date
2016-06
Authors
Wan Mohamad Hafiz Wan Zainal Abidin
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Abstract
Acrylate-Siloxane Copolymer photoactive compound has successfully been patterned on top of PDMS substrate. It was observed the degree of the pattern resolution increases as the amount of Tin increases due to higher chemical interaction between Acrylate-PDMS, Acrylate-Acrylate and PDMS-PDMS molecules. However higher percentage of Tin in the system will interfere with the developing process. Although the patterning process can be done using the copolymer photoactive, further optimization in terms of pre-baking time, post-baking time and the temperature uses for both baking time is crucial in order to determine the allowable percentage of toluene in the system as well as facilitating the developing process without causing flaws in the resultant pattern. Several different physical properties of both photoactive and substrate materials were obtained using various testing method and results are further discussed.