Patterning of strechable photoactive acrylate-siloxane copolymer using photolithography technique

dc.contributor.author	Wan Mohamad Hafiz Wan Zainal Abidin
dc.date.accessioned	2021-07-29T01:35:45Z
dc.date.available	2021-07-29T01:35:45Z
dc.date.issued	2016-06
dc.description.abstract	Acrylate-Siloxane Copolymer photoactive compound has successfully been patterned on top of PDMS substrate. It was observed the degree of the pattern resolution increases as the amount of Tin increases due to higher chemical interaction between Acrylate-PDMS, Acrylate-Acrylate and PDMS-PDMS molecules. However higher percentage of Tin in the system will interfere with the developing process. Although the patterning process can be done using the copolymer photoactive, further optimization in terms of pre-baking time, post-baking time and the temperature uses for both baking time is crucial in order to determine the allowable percentage of toluene in the system as well as facilitating the developing process without causing flaws in the resultant pattern. Several different physical properties of both photoactive and substrate materials were obtained using various testing method and results are further discussed.	en_US
dc.identifier.uri	http://hdl.handle.net/123456789/13861
dc.language.iso	en	en_US
dc.title	Patterning of strechable photoactive acrylate-siloxane copolymer using photolithography technique	en_US
dc.type	Other	en_US

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