Structural And Optical Studies Of Wide Band-Gap AlxGa1-XN (0 ≤X≤ 1) Semiconductors

dc.contributor.authorNg, Sha Shiong
dc.date.accessioned2022-02-11T08:54:07Z
dc.date.available2022-02-11T08:54:07Z
dc.date.issued2007
dc.description.abstractThe aim of this project is to study the structural and optical properties of wideband gap AlxGa1-xN (O < x < 1) semiconductors by means of various non-contact and non-destructive characterization tools. These include the scanning electron microscopy (SEM), energy dispersive x-ray (EDX) analysis, atomic force microscopy (AFM) and xray diffraction (XRD) for structural characterization, and spectral reflection technique, ultraviolet-visible (UV-VIS), photoluminescence (PL), Raman, polarized infrared (IR) reflectance and polarized I R attenuated total reflection (ATR) spectroscopy for optical characterization.en_US
dc.identifier.urihttp://hdl.handle.net/123456789/14635
dc.language.isoenen_US
dc.publisherUniversiti Sains Malaysiaen_US
dc.subjectStructural And Optical Studies Of Wide Band-Gap AlxGa1-XN (0 ≤X≤ 1)en_US
dc.subjectSemiconductorsen_US
dc.titleStructural And Optical Studies Of Wide Band-Gap AlxGa1-XN (0 ≤X≤ 1) Semiconductorsen_US
dc.typeThesisen_US
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