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Deposition And Characterisation Of Solution Processed Indium Gallium Zinc Oxide Thin Film On Silicon Substrate

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dc.contributor.authorNabihah Binti Kasim
dc.date.accessioned2023-12-13T03:06:07Z
dc.date.available2023-12-13T03:06:07Z
dc.date.issued2022-09
dc.description.abstractThis research was conducted with an objective to deposit optimum polycrystalline indium gallium zinc oxide (IGZO) on silicon (Si) substrate by using solution processed method. Specifically, sol-gel method was selected to prepare IGZO precursor solution and spin coating method was used to deposit the film.
dc.identifier.urihttps://erepo.usm.my/handle/123456789/17914
dc.subjectDeposition And Characterisation Of Solution Processed Indium Gallium Zinc Oxide Thin Film
dc.subjectSilicon Substrate
dc.titleDeposition And Characterisation Of Solution Processed Indium Gallium Zinc Oxide Thin Film On Silicon Substrate
dc.typeResource Types::text::thesis::doctoral thesis
dspace.entity.typePublication
oairecerif.author.affiliationUniversiti Sains Malaysia
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